发明名称 METHOD FOR ANALYZING DC SUPERPOSITION CHARACTERISTICS OF INDUCTANCE ELEMENT AND ELECTROMAGNETIC FIELD SIMULATOR
摘要 A method for analyzing the DC superposition characteristics of an inductance device using a magnetic field analysis simulator, comprising a first step of determining an initial magnetization curve from initial magnetization to saturation magnetization, and pluralities of minor loops at different operating points, on a toroidal core made of the same magnetic material as that of the inductance device, and obtaining point-list data showing the relation between magnetic flux density or magnetic field strength and incremental permeability from the incremental permeability at each operating point; a second step of determining an operating point at a predetermined direct current on each element obtained by mesh-dividing an analysis model of the inductance device by a magnetic field analysis simulator based on the initial magnetization curve of the core, allocating the incremental permeability to the operating point from the point-list data, and integrating the inductance of each element obtained from the incremental permeability to determine the inductance of the entire inductance device; and a third step of repeating the second step at different direct current levels to determine the DC superposition characteristics.
申请公布号 KR20110081943(A) 申请公布日期 2011.07.15
申请号 KR20117005544 申请日期 2009.09.30
申请人 HITACHI METALS, LTD. 发明人 TACHIBANA TAKESHI;TANAKA SATORU;KIKUCHI KEIKO
分类号 G01R27/26;G06F17/50 主分类号 G01R27/26
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