发明名称 SPATIAL LIGHT MODULATOR, EXPOSURE DEVICE AND METHOD OF MANUFACTURING THEM
摘要 <P>PROBLEM TO BE SOLVED: To stabilize the characteristics of a spatial light modulator for a long period. <P>SOLUTION: The spatial light modulator has: a substrate; and a reflection mirror which rocks with respect to the substrate. The reflection mirror has: a reflection face; and a structure material which includes a face intersecting with the reflection face and is disposed on the back face of the reflection face to resist to bending stress acting on the reflection face. In the spatial light modulator, the structure material may have a bottom face further intersecting with the face. Also, in the spatial light modulator, the structure material may have a through hole which performs communicative connection between the space, enclosed by the structure material and the reflection face, and the outside of the space. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011138046(A) 申请公布日期 2011.07.14
申请号 JP20090298815 申请日期 2009.12.28
申请人 NIKON CORP 发明人 SUZUKI YOSHIHIKO;KONISHI HIROSHI;SUZUKI JUNJI
分类号 G02B26/08;B81B3/00;B81C1/00;G03F7/20;H01L21/027 主分类号 G02B26/08
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