| 摘要 |
An active matrix substrate of a display device of the present invention comprises a glass substrate, a plurality of connection terminals (41) formed on the surface of the glass substrate and arranged in parallel with one another at an equal interval, and an interlayer insulating film (38) covering the plurality of connection terminals. The edge of the interlayer insulating film is so formed that tips of the plurality of connection terminals are exposed. A notch (42) is formed along the edge of the interlayer insulating film between two adjacent connection terminals. The notch has a stepped portion (46) comprising the first face (43), which is the bottom face of the notch, the second face (44), which is at a higher level than the first face, and a sloped face (45), which continues from the first face to the second face. It is possible to avoid formation of pixel electrode material residue near the edge of the interlayer insulating film when a pixel electrode is formed by photo-etching through the formation of a pixel electrode material layer and a photosensitive resist layer on the interlayer insulating film.
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