| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. <P>SOLUTION: An exposure device (EX) forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL) and performs exposure of a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the liquid immersion area (AR2). The exposure device (EX) includes a measuring device (60) for measuring at least either of characteristics and components of the liquid (LQ) for forming the liquid immersion area (AR2). <P>COPYRIGHT: (C)2011,JPO&INPIT |
