| 摘要 |
PROBLEM TO BE SOLVED: To prevent a drop of a Duty ratio of a recording layer due to reduction of a resist in a working process. SOLUTION: A method of manufacturing a patterned recording medium such as BPM (Bit Patterned Media) and DTM (Discrete Track Media) includes: a deposition step of depositing a resist protective film on a resist pattern formed in a workpiece including the recording layer; a resist protective film-working step of forming a mask by removing the resist protective film remaining at a base of the pattern; and a recording layer-working step of working the recording layer in a pattern shape by dry etching with the resist pattern and the resist protective film as masks. COPYRIGHT: (C)2011,JPO&INPIT
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