发明名称 APPARATUS FOR SUBSTRATE EDGE POLISHING
摘要 PURPOSE: A section grinding apparatus for a substrate is provided to improve the efficiency of continuous production by controlling the movement of a grinding wheel in a cutting direction and a thrust direction according to the abrasion of the peripheral portion of the grinding wheel. CONSTITUTION: A section grinding apparatus for a substrate comprises a grinding wheel(1), a rotational driving unit(30), and a transfer control unit. The peripheral portion of the grinding wheel comprises an elastic material and grinds a section of substrate(2). The rotational driving unit comprises a load current detecting unit and a load current value judging unit. The load current detecting unit detects the load current when the grinding wheel contacts the substrate. The transfer control unit has control units(10,20) for movement of cutting and thrust directions to the section of the substrate. The movement of the grinding wheel in the cutting and thrust directions is controlled based on the load current value judging unit.
申请公布号 KR20110081512(A) 申请公布日期 2011.07.14
申请号 KR20100001710 申请日期 2010.01.08
申请人 NAKAMURA-TOME PRECISION INDUSTRY CO., LTD. 发明人 OBATA TOMOAKI;OKUWA KOICHI
分类号 B24B21/12 主分类号 B24B21/12
代理机构 代理人
主权项
地址