| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device capable of simplifying a manufacturing process. <P>SOLUTION: The display device 1 is manufactured as follows. A gate electrode layer 11, a gate insulating film 12 and a semiconductor layer 13 are sequentially formed on a substrate 10, then a source/drain electrode layer 15 is formed over regions 10A and 10B. The source/drain electrode layer 15 includes an electrode layer 15a and an upper metal layer 15b so that the electrode layer 15a is prevented from being damaged when an inter-pixel insulating film 17 is patterned and formed in the subsequent process. After forming the inter-pixel insulating film 17, the upper metal layer 15b of the source/drain electrode layer 15 is selectively removed from the region 10A, thereby exposing the surface of the electrode layer 15a. An organic layer 18 and a cathode electrode 19 are formed on the exposed electrode layer 15a, thereby forming an organic light emitting element 1a using the source/drain electrode layer 15 (electrode layer 15a) as an anode electrode in the region 10A. <P>COPYRIGHT: (C)2011,JPO&INPIT |
