发明名称 |
CHARGE ALTERATION USING ULTRAVIOLET RADIATION |
摘要 |
A system(109) for altering charge of a dielectric material (90) uses ultraviolet radiation. The system includes a gas source (102) and an ultraviolet radiation source (104). The gas source (102) introduced a gas (103) to a region adjacent the dielectric material (90). The ultraviolet radiation source (104) is arranged to irradiate the region to adjust charge on the dielectric material. A method of altering charge on a dielectric material (90) is also disclosed in which a gas (103) is introduced to a region adjacent the dielectric materia (90)1. The region is then irradiated with the ultraviolet radiation (105) to alter charge on the dielectric material (90).
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申请公布号 |
US2011168924(A1) |
申请公布日期 |
2011.07.14 |
申请号 |
US20080808699 |
申请日期 |
2008.12.16 |
申请人 |
JENDREJACK RICHARD M;PHILLIPS DAVID L;JOHNSON MITCHELL A F;BENSON PETER T |
发明人 |
JENDREJACK RICHARD M.;PHILLIPS DAVID L.;JOHNSON MITCHELL A.F.;BENSON PETER T. |
分类号 |
H05F3/06 |
主分类号 |
H05F3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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