发明名称 |
SUBSTRATE HOLDING ROTATING MECHANISM, AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
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申请公布号 |
US2011168214(A1) |
申请公布日期 |
2011.07.14 |
申请号 |
US201113073340 |
申请日期 |
2011.03.28 |
申请人 |
KANEKO HIROYUKI;OGAWA TAKAHIRO;SUGITA KENICHI |
发明人 |
KANEKO HIROYUKI;OGAWA TAKAHIRO;SUGITA KENICHI |
分类号 |
B08B3/00;B24B41/06;H01L21/68 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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