| 摘要 |
PROBLEM TO BE SOLVED: To achieve high-contrast pattern projection. SOLUTION: Calibration is performed for calibrating the positional relationship among a measuring apparatus, an illumination apparatus, and an imaging apparatus (S101). Brightness unevenness correction processing within the projection plane of two-dimensional pattern light is performed (S102). Adjustment of a light source light amount for compensating for decreased peak brightness is performed (S103). The two-dimensional pattern light is projected onto an object under measurement (S104). The reflected two-dimensional pattern light is imaged by the imaging apparatus (S105). A brightness change in the two-dimensional pattern light and the position deviation of a pattern edge caused by the imaging apparatus are corrected by applying unevenness correction processing on the acquired two-dimensional pattern image (S106). On the basis of the two-dimensional pattern image subjected to the correction processing, the measuring apparatus acquires distance information in the depth direction at each measurement point of the object under measurement to perform distance measurement processing (S107). COPYRIGHT: (C)2011,JPO&INPIT |
