发明名称 NANOIMPRINT METHOD
摘要 A method for applying a patterned coating of resist onto a surface of a substrate, includes embossing flowable resist at least once, wherein the flowable resist is respectively embossed between a patterned surface of a stamp and a carrier, whereby the stamp surface is provided with a patterned resist surface. The stamp carrying a first patterned part of the resist coating and the carrier carrying a second part of the resist coating are separated from each other. The patterned resist coating is transferred, wherein the first patterned part of the resist coating on the surface of the stamp is pressed against the surface of the substrate and the patterned resist coating is transferred onto the surface of the substrate. The first patterned part of the resist coating is cured and a demolding step is performed by separating the stamp from the first patterned part of the resist coating.
申请公布号 US2011171432(A1) 申请公布日期 2011.07.14
申请号 US201113035602 申请日期 2011.02.25
申请人 发明人 KOO NAMIL;KIM JUNG WUK;MOORMANN CHRISTIAN
分类号 B32B3/30;B29C59/02;C23F1/00 主分类号 B32B3/30
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