| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition that has high lithography characteristics and forms a resist pattern with a favorable shape, and a resist pattern forming method. <P>SOLUTION: The positive resist composition contains a base component (A) whose solubility in an alkali developer is increased by the action of an acid and an acid generator component (B) which generates an acid by exposure. The base component (A) includes a polymeric compound (A1) having a core formed of a polymer where molecular weight is 500 or larger and 20,000 or smaller and at least one arm bonded to the core. <P>COPYRIGHT: (C)2011,JPO&INPIT |
