| 摘要 |
PROBLEM TO BE SOLVED: To provide a phase-change structure which contains a phase-change substance layer pattern of a minute size, having a superior step coverage or gap-fill characteristics for keeping a resistance margin and maintenance characteristic, in HARS (high-aspect-ratio-structure). SOLUTION: The phase-change structure fills partially the HARS, fills a first phase-change substance layer pattern, including a first phase-change substance and the remainder of the HARS, and includes a second phase-change substance having a composition being different from the first phase-change substance. A phase-change substance layer pattern, which the HARS is fully filled through an in-situ reflow mechanism without defects, is formed. COPYRIGHT: (C)2011,JPO&INPIT
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