发明名称 PELLICLE MOUNTING DEVICE, PELLICLE MOUNTING METHOD, AND METHOD OF MANUFACTURING PATTERNED SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an inspection device and method capable of inspecting with high sensitivity, and to provide a method of manufacturing a patterned substrate. <P>SOLUTION: The pellicle mounting device includes: press-contact heads 20 disposed movably to a press-contact position corresponding to a pellicle frame 41 temporarily stuck on a mask 40; a pressure block 24 disposed at each end of the mask surface opposite to the pellicle frame 41 in the state where the press-contact heads 20 are moved to the press-contact position; a pressure rod 26 facing the pellicle frame 41 in the state where the press-contact heads 20 are moved to the press-contact position; and a suction pad 29 configured to make a distance between the pressure rod and the pressure block 24 shorter in a direction vertical to the pattern surface of the mask 40 so that the pellicle frame 41 may be brought in press-contact with the mask 40. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011137951(A) 申请公布日期 2011.07.14
申请号 JP20090297355 申请日期 2009.12.28
申请人 LASERTEC CORP 发明人 MATSUMOTO MASANORI;YONEZAWA MAKOTO
分类号 G03F1/62 主分类号 G03F1/62
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