| 摘要 |
In one embodiment, an immersion lithography apparatus has a substrate stage that holds a workpiece and is configured to be possible to take an exposure position under a light projection unit and to keep away from the position. A cleaning stage has a reservoir of a cleaning or immersion liquid, and is configured to be possible to take the exposure position by replacing the substrate stage. An immersion liquid supply system supplies the immersion liquid between the light projection unit and the workpiece or in the reservoir, and an immersion liquid recovery system recovers the immersion liquid. A cleaning liquid supply system supplies the cleaning liquid in the reservoir to include contact regions to the immersion liquid, and a cleaning liquid recovery system recovers the cleaning liquid. A concentration measuring instrument is installed on the immersion or cleaning liquid recovery system, and measures a concentration of the cleaning liquid.
|
