A METAL ORGANICE CHEMICAL VAPOR DEPOSITION APPARATUS HAVING A HEATER TO ADJUST HEIGHT

摘要

PURPOSE: A metal organic chemical vapor deposition apparatus having a heater to adjust height is provided to prevent the internal contamination of a reaction chamber by controlling the height of a heater from the outside of the reaction chamber. CONSTITUTION: In a metal organic chemical vapor deposition apparatus having a heater to adjust height, a predetermined process is performed in a reaction chamber(100). A susceptor(150) supports a substrate in the processing chamber. A heating unit heats the susceptor by a heater coil in under the susceptor. A height adjusting part controls the height of the heater coil from the outside of the processing chamber.