| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a chemically amplified resist composition, which can reduce development defects on a pattern. <P>SOLUTION: There are provided the method for manufacturing the chemically amplified resist composition containing (A) a compound that generates an acid when irradiated with active light or radiation, (B) a resin whose solubility to alkali developing solution changes by the action of the acid, (C) a basic compound, (D) a surfactant, and (E) a solvent, which includes a step in which a solution of component (A) and a solution of component (B) are prepared, and the solution of component (B) is filtrated with a filter, and a step in which the solution of component (A) and the solution of component (B) are mixed, and the chemically amplified resist composition obtained by the method. <P>COPYRIGHT: (C)2011,JPO&INPIT |
