发明名称 METHOD FOR FABRICATING A RESISTOR FOR A RESISTANCE RANDOM ACCESS MEMORY
摘要 A method for fabricating a resistor for a resistance random access memory (RRAM) includes: (a) forming a first electrode over a substrate; (b) forming a variable resistance layer of zirconium oxide on the first electrode under a working temperature, which ranges from 175° C. to 225° C.; and (c) forming a second electrode of Ti on the variable resistance layer.
申请公布号 US2011171811(A1) 申请公布日期 2011.07.14
申请号 US20100793833 申请日期 2010.06.04
申请人 NATIONAL CHIAO TUNG UNIVERSITY 发明人 TSENG TSEUNG-YUEN;WANG SHENG-YU;TSAI CHEN-HAN
分类号 H01L45/00 主分类号 H01L45/00
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