| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for setting pattern measuring conditions, to set a measuring position while preventing a reduction in working efficiency when the measuring position of a complicated pattern or a sample having a plurality of patterns whose optical proximity effect is to be evaluated, on the basis of defective coordinates. <P>SOLUTION: A first measuring position is set in a two-dimensional area to be set on the layout data of the pattern, at the inside of a contour which is superposed on reference lines comprising a plurality of line segments and shows a pattern including defective coordinates on the layout data, and between the intersection points between the contour and the reference lines. The second measuring position is set at the outside of the contour, and between the intersection points of the contour with another portion of the contour or another contour. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
