发明名称
摘要 The present invention generally relates to a method and apparatus for depositing a layer onto a substrate as the substrate is moving through the processing chamber. The substrate may move along a roll to roll system. A roll to roll system is a system where a substrate may be unwound from a first roll so that the substrate may undergo processing and then re-wound onto a second roll after the processing. As the substrate moves through the processing chamber, a plasma source may produce a plasma. An electrical bias applied to the substrate may draw the plasma to the substrate and hence, permit deposition of material onto the substrate as the substrate moves through the chamber.
申请公布号 JP2011520029(A) 申请公布日期 2011.07.14
申请号 JP20100550720 申请日期 2009.02.17
申请人 发明人
分类号 C23C16/54;C23C14/12;H01L51/50;H05B33/10;H05H1/24;H05H1/46 主分类号 C23C16/54
代理机构 代理人
主权项
地址