发明名称 Fluorescent X-ray analysis apparatus
摘要 <p>There is provided a fluorescent X-ray analysis apparatus in which a detection lower limit has been improved by reducing an X-ray generated subsidiarily. The fluorescent X-ray analysis apparatus is one which possesses an X-ray source irradiating a primary X-ray, and a detector in which a collimator having a through-hole in its center part has been placed in a front face, and in which, by the detector, there is detected a primary fluorescent X-ray which is generated from a sample by irradiating the primary X-ray to a sample, and passes through the through-hole of the collimator. The X-ray source and the detector are disposed while adjoining the sample, and an irradiated face of the X-ray source or the detector, to which a primary scattered ray having been generated by the fact that the primary X-ray scatters in the sample and the primary fluorescent X-ray having been generated from the sample are irradiated, is covered by a secondary X-ray reduction layer reducing a secondary scattered ray and a secondary fluorescent X-ray, which are generated by irradiations of the primary scattered ray and the primary fluorescent X-ray.</p>
申请公布号 EP1840561(B1) 申请公布日期 2011.07.13
申请号 EP20070251404 申请日期 2007.03.30
申请人 SII NANO TECHNOLOGY INC. 发明人 FUKAI, TAKAYUKI;MATOBA, YOSHIKI
分类号 G01N23/223;G01N33/02 主分类号 G01N23/223
代理机构 代理人
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