发明名称 APPARATUS FOR PROCESSING A SUBSTRATE USING A SUPERCRITICAL FLUID
摘要 PURPOSE: An apparatus for processing a substrate using a supercritical fluid is provided to prevent the decrease of the pressure of a space in which a substrate is processed by completely closing a separation chamber with a fastening ring. CONSTITUTION: In an apparatus for processing a substrate using a supercritical fluid, a substrate is arranged inside a lower chamber(110) and form a first gear tooth(112) on the outer circumference of the lower chamber. An upper chamber(120) and a lower chamber are combined with each other and forms a closed space for processing the substrate. The upper chamber has a second gear tooth corresponding to first gear tooth in the outer circumference. A fastening ring(130) is installed in the circumference of the upper and lower chamber and is rotatable and a third gear tooth engaging with the first and second gear tooth. An insertion groove is formed to receive the first gear tooth and the second gear tooth.
申请公布号 KR20110080950(A) 申请公布日期 2011.07.13
申请号 KR20100001404 申请日期 2010.01.07
申请人 SEMES CO., LTD. 发明人 KIM, TAE HO;PARK, JOO JIB
分类号 H01L21/302 主分类号 H01L21/302
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