| 摘要 |
A process of etching silicon includes treating silicon, e.g. granules or bulk material, with an etching solution, including HF, Ag+ ions and nitrate ions thereby etching the silicon to form silicon having etched pillars on its surface, which silicon includes a surface deposit of silver. The etched silicon is then separated from the spent etching solution. The silver from the etched silicon is dissolved using nitric acid to form a solution containing Ag+ ions and nitrate ions. The solution containing Ag+ ions and nitrate ions is mixed with further HF to form a further etching solution. The further etching solution is used to treat further silicon. The pillars may be used as an anode material in a Li-ion battery. |
