| 摘要 |
<p>PURPOSE: Substrate processing device and method are provided to rapidly discharge gas from a chamber since the positions of an upper exhaust unit and a lower exhaust unit are set through the drying process test of the substrate. CONSTITUTION: A substrate processing device comprises a chamber, a transfer unit(120) and a fluid spray unit. The chamber is used as a space for the drying process of a substrate. The transfer unit is installed in the space and transfers the substrate. The fluid spray unit is arranged on the upper or lower part of the transfer unit. The fluid spray unit sprays dry gas to dry the substrate. The chamber comprises top and bottom(111), wherein an upper exhaust unit is formed on the top and a lower exhaust unit is formed on the bottom.</p> |
