| 摘要 |
PURPOSE: A high-resolution X-ray diffraction measuring method is provided to improve the accuracy and sensitivity in high-resolution X-ray diffraction measurement for an epitaxial thin film and other crystal structures. CONSTITUTION: A high-resolution X-ray diffraction measuring method comprises a step of orienting a converging beam(30) of X-rays toward the surface of a sample(22) having first and second crystalline layers of different crystalline properties, a step of sensing X-rays that are diffracted from the sample while decomposing detected X-rays in order to generate a first diffraction spectrum including at least first and second diffraction peaks, a step of locating a beam blocker(49) in the converging beam in order to block the range of angle including the first diffraction peak, a step of sensing X-rays that are diffracted from the sample while the beam blocker is located in the converging beam in order to generate a second diffraction spectrum including at least the second diffraction peak, and a step of analyzing the second diffraction spectrum in order to distinguish the characteristic of the second crystalline layer.
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