| 摘要 |
<p>PURPOSE: A multi-gray scale photomask and a manufacturing method thereof, and a pattern transfer method are provided to secure a resist pattern with a film of a desired thickness without the interference of the pattern shape in a semi-transmission region. CONSTITUTION: In a multi-gray scale photomask and a manufacturing method thereof, and a pattern transfer method, a semi-transmission film passes exposure light which is formed in a transparent substrate. A shied film is processed by a transfer pattern to have a transmission region(D), a shielding region(A), and a semi-transmission region(C).</p> |
