POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A positive type resist composition and a method for forming a resist pattern are provided to improve the resist pattern shape, the thickness uniformity of pattern dimension, the line widths, and the roughness. CONSTITUTION: A positive type resist composition includes a base component. The solubility of the base component with respect to an alkaline developing agent is increased by the action of acid. An acid generating component generating acid by exposure is further included in the base component. The base component further includes fluorine-containing polymer compound generating acid by exposure. The base component includes a resin component. The resin component includes a structural unit represented by chemical formula a0-1, a structural unit derived from acrylic acid ester containing acid dissolution inhibitor. The fluorine-containing polymer compound includes a structural unit represented by chemical formula c0-1 or c0-2 and a structural unit represented by chemical formula c1.