SUBSTRATE CLEANING APPARATUS

摘要

PURPOSE: A substrate cleaning apparatus is provided to improve cleansing power by allowing the edge of a substrate to be cleaned when cleaning the backside of the substrate. CONSTITUTION: In a substrate cleaning apparatus, a substrate support portion(120) supports a substrate. A back-nozzle part(130) is installed on the top side of the substrate support portion and discharges washing solution to the backside of the substrate in a process. A first nozzle(132) includes a first nozzle hole discharging the washing solution in vertical direction to the backside of the substrate. A second nozzle(133) includes a second nozzle hole discharging the washing solution in diagonal direction to the backside of the substrate.