| 摘要 |
<p>PURPOSE: A photo-sensitive molecular compound and a photo-resist composition including the same are provided to control the solubility of the composition with respect to a developing solution by including hydrophilic functional groups and lyphophilic functional groups. CONSTITUTION: A photo-sensitive molecular compound includes a structure which is represented by chemical formula 1. In the chemical formula 1, the R1 is C3 to C30 hydrocarbon. The R2 is C1 to C30 hydrocarbon containing oxygen atom. The photo-resist composition includes 1 to 85 weight% of the photo-sensitive molecular compound, 0.05 to 15 parts by weight a photo-acid generator, based on 100 parts by weight of the photo-resist composition, and an organic solvent.</p> |
