发明名称 |
ELECTROSTATIC CHUCK UNIT AND APPARATUS FOR PROCESSING A SUBSTRATE HAVING THE SAME |
摘要 |
PURPOSE: An electrostatic chuck unit and a substrate processing device with the same are provided to adjust the height of a focus ring about an electrostatic chuck. CONSTITUTION: An electrostatic chuck(120) is arranged on a base unit(110) and supports a substrate. A focus ring surrounds the electrostatic chuck and focuses a processing gas on the substrate. A driving unit(140) is connected to the focus ring through the base unit. A driving unit is connected to the bottom of the focus ring through a penetration hole.
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申请公布号 |
KR20110080811(A) |
申请公布日期 |
2011.07.13 |
申请号 |
KR20100001223 |
申请日期 |
2010.01.07 |
申请人 |
SEMES CO., LTD. |
发明人 |
MUN, SANG MIN |
分类号 |
H01L21/687;H01L21/28;H01L21/68 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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