发明名称 ELECTROSTATIC CHUCK UNIT AND APPARATUS FOR PROCESSING A SUBSTRATE HAVING THE SAME
摘要 PURPOSE: An electrostatic chuck unit and a substrate processing device with the same are provided to adjust the height of a focus ring about an electrostatic chuck. CONSTITUTION: An electrostatic chuck(120) is arranged on a base unit(110) and supports a substrate. A focus ring surrounds the electrostatic chuck and focuses a processing gas on the substrate. A driving unit(140) is connected to the focus ring through the base unit. A driving unit is connected to the bottom of the focus ring through a penetration hole.
申请公布号 KR20110080811(A) 申请公布日期 2011.07.13
申请号 KR20100001223 申请日期 2010.01.07
申请人 SEMES CO., LTD. 发明人 MUN, SANG MIN
分类号 H01L21/687;H01L21/28;H01L21/68 主分类号 H01L21/687
代理机构 代理人
主权项
地址