| 摘要 |
PURPOSE: A substrate processing device is provided to drastically reduce accumulation of by-products in edge parts of a lower panel and drastically increase process uniformity. CONSTITUTION: A heater(120) is arranged in a processing chamber(110) and supports and heats at least one substrate. A gas supply unit(130) supplies a processing gas for processing the substrate or a cleaning gas for cleaning the inner surfaces of the processing chamber into the processing chamber. The gas supply unit is connected to a gas source which provides a processing gas or a cleaning gas. A coolant flowing path(134) is formed in an upper panel(132).
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