发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device and a manufacturing method thereof are provided to enhance a refresh property of a cell by depositing an absorption preventing layer of a dielectric film on a semiconductor substrate and dividing the dielectric film among capacitors. CONSTITUTION: An absorption prevention layer(140) is formed on a semiconductor substrate including a lower electrode contact plug. A lower electrode(210) is connected to the lower electrode contact plug. A dielectric separating structure includes a dielectric film(220) formed on the lower electrode.
申请公布号 KR20110080509(A) 申请公布日期 2011.07.13
申请号 KR20100000771 申请日期 2010.01.06
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, HYUNG JIN
分类号 H01L27/108;H01L21/8242 主分类号 H01L27/108
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