| 摘要 |
PURPOSE: An apparatus and a method for cleaning a substrate are provided to improve cleansing efficiency by polishing and cleaning a substrate in which is stably held. CONSTITUTION: In an apparatus and a method for cleaning a substrate, a conveying unit transfers the substrate. At least one cleaning unit(230,240) is installed in the movement route of a substrate and includes at lest one cleaning head which is rotated around a center shaft to pressure the substrate so that foreign material is removed from the substrate. At least one plane supporter is faced with the cleaning units and is plane-contacted with the substrate, and it supports a part which is cleaned by the cleaning unit.
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