发明名称 |
Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method |
摘要 |
A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
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申请公布号 |
US7976637(B2) |
申请公布日期 |
2011.07.12 |
申请号 |
US20070683164 |
申请日期 |
2007.03.07 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NAGAIKE HIROSHI;MORIYA TSUYOSHI |
分类号 |
B08B6/00;C25F1/00 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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