发明名称 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
摘要 A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
申请公布号 US7976637(B2) 申请公布日期 2011.07.12
申请号 US20070683164 申请日期 2007.03.07
申请人 TOKYO ELECTRON LIMITED 发明人 NAGAIKE HIROSHI;MORIYA TSUYOSHI
分类号 B08B6/00;C25F1/00 主分类号 B08B6/00
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