发明名称 |
System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes |
摘要 |
An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.
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申请公布号 |
US7977628(B2) |
申请公布日期 |
2011.07.12 |
申请号 |
US20080146122 |
申请日期 |
2008.06.25 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
GRANT JOHN FRANCIS;SPLINTER PATRICK RICHARD |
分类号 |
H01J49/00 |
主分类号 |
H01J49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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