发明名称 Method of manufacturing a semiconductor device
摘要 The invention aims to provide substrate treatment equipment that can automatically collect a substrate in a normal condition without needing manual operation. The equipment includes a substrate holder 26 for holding substrates 12 in a multistage manner and a substrate transfer unit 34 for transferring the substrates 12 into the substrate holder 26, wherein a substrate holding condition of the substrate holder 26 is sensed by a sensing section 60. The sensing section 60 has photo-sensors 64a, 64b, and sensing waveforms sensed by the photo-sensors 64a, 64b are compared with a normal waveform. A control section 66 is provided, which controls a substrate transfer unit 34 such that substrates 12 other than at least a substrate 12 that was determined to be abnormal are transferred by the unit.
申请公布号 US7975376(B2) 申请公布日期 2011.07.12
申请号 US20080081200 申请日期 2008.04.11
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 HIRANO MAKOTO;YOSHIDA AKIHIRO
分类号 H01R43/00;H01L21/00;H01L21/22;H01L21/324;H01L21/68 主分类号 H01R43/00
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