发明名称 |
Method for detoxifying HCD gas and apparatus therefor |
摘要 |
Hexachlorodisilane is decomposed into hydrochloric acid, silicon dioxide and water by introducing hexachlorodisilane-containing flue gas into a reaction region without moistening the flue gas and by supplying oxygen-containing gas that also contains a small amount of moisture to the reaction region maintained at a temperature at which hexachlorodisilane decomposes.
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申请公布号 |
US7976807(B2) |
申请公布日期 |
2011.07.12 |
申请号 |
US20070224508 |
申请日期 |
2007.02.06 |
申请人 |
KANKEN TECHNO CO., LTD.;TOAGOSEI CO., LTD. |
发明人 |
IMAMURA HIROSHI;TAKEUCHI HIROAKI;ISHIKAWA KOJI;SUZUKI HIROSHI;MORIYA AKIRA;HARADA KATSUYOSHI |
分类号 |
B01D53/68 |
主分类号 |
B01D53/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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