发明名称 Integrated circuit having a semiconductor substrate with a barrier layer
摘要 An integrated circuit having a semiconductor substrate with a barrier layer is disclosed. The arrangement includes a semiconductor substrate and a metallic element. A carbon-based barrier layer is disposed between the semiconductor substrate and the metallic element.
申请公布号 US7977798(B2) 申请公布日期 2011.07.12
申请号 US20070828865 申请日期 2007.07.26
申请人 INFINEON TECHNOLOGIES AG;QIMONDA AG 发明人 DERTINGER STEPHAN;MARTIN ALFRED;HASLER BARBARA;SOMMER GRIT;BINDER FLORIAN
分类号 H01L23/495;H01L23/48 主分类号 H01L23/495
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