发明名称 |
Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems |
摘要 |
A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
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申请公布号 |
US7976634(B2) |
申请公布日期 |
2011.07.12 |
申请号 |
US20070937388 |
申请日期 |
2007.11.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CARLSON DAVID KEITH;KUPPURAO SATHEESH;BECKFORD HOWARD;DINIZ HERMAN;PATALAY KAILASH KIRAN;BURROWS BRIAN HAYES;CAMPBELL JEFFREY RONALD;ZHU ZOUMING;LI XIAOWEI;SANCHEZ ERROL ANTONIO |
分类号 |
C23C16/452;C23C16/02;C23C16/06;C23C16/46;C23F1/00;H01L21/306 |
主分类号 |
C23C16/452 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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