发明名称 Projection optical system, exposure system, and exposure method
摘要 A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan Θ<1.7 is satisfied.
申请公布号 US7978310(B2) 申请公布日期 2011.07.12
申请号 US20100719455 申请日期 2010.03.08
申请人 NIKON CORPORATION 发明人 IKEZAWA HIRONORI;KUDO YUJI;OMURA YASUHIRO
分类号 G03B27/54;G03B27/32 主分类号 G03B27/54
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