发明名称 |
Exposure data preparation method and exposure method |
摘要 |
In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of: classifying a pattern in terms of a target linewidth; setting a standard characteristic showing the relationship between a standard dose and a resultant linewidth of a resist pattern for a group of patterns having the target linewidth; and preparing exposure data by correcting a shape and dose so that a characteristic showing the relationship between dose of each pattern having the target linewidth and a resultant linewidth of a resist pattern follows the standard characteristic.
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申请公布号 |
US7977018(B2) |
申请公布日期 |
2011.07.12 |
申请号 |
US20080332456 |
申请日期 |
2008.12.11 |
申请人 |
FUJITSU SEMICONDUCTOR LIMITED |
发明人 |
OGINO KOZO;MACHIDA YASUHIDE |
分类号 |
G03F9/00;G03C5/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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