| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which has enhanced an exhaust conductance of a shielded space structured by a deposition shield plate and has effectively reduced a residual gas while minimizing the complexity of a drive mechanism and the increase of the footprint. SOLUTION: The film-forming apparatus includes an opening provided in the shielded space, and a movable plate which can seal an exhaust port existing between a vacuum pump and a vacuum chamber. The movable plate can be moved to: the first position at which the opening is blocked and the exhaust port is opened, when the film is formed; the second position at which both of the opening and the exhaust port are opened, when a substrate to be treated is transported; and the third position at which the exhaust port is sealed. COPYRIGHT: (C)2011,JPO&INPIT
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