发明名称 ASSYMETRIC SURFACE TEXTURING FOR USE IN A PHOTOVOLTAIC CELL AND METHOD OF MAKING
摘要 A novel surface texturing provides improved light-trapping characteristics for photovoltaic cells. The surface is asymmetric and includes shallow slopes at between about 5 and about 30 degrees from horizontal as well as steeper slopes at about 70 degrees or more from horizontal. It is advantageously used as either the front or back surface of a thin semiconductor lamina, for example between about 1 and about 20 microns thick, which comprises at least the base or emitter of a photovoltaic cell. In embodiments of the present invention, the shallow slopes are formed using imprint photolithography.
申请公布号 US2011162688(A1) 申请公布日期 2011.07.07
申请号 US201113048955 申请日期 2011.03.16
申请人 TWIN CREEKS TECHNOLOGIES, INC. 发明人 PETTI CHRISTOPHER J.
分类号 H01L31/052;H01L31/0232;H01L31/18 主分类号 H01L31/052
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