COMPOSITION FOR THE BOTTOM LAYER OF A RESIST, AND METHOD USING SAME TO MANUFACTURE A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

Provided is a composition for the bottom layer of a resist, comprising: an organic-silane-based polycondensation compound as expressed in chemical formulae 1 to 3; and a solvent. The composition for the bottom layer of a resist easily controls the refractive index and light absorption, and can provide a bottom layer for a resist that has good antireflective characteristics, and a semiconductor integrated circuit device using same.