| 摘要 |
<p>PURPOSE: A method for manufacturing a nano imprint mask is provided to improve the accuracy of a nano imprinting process by accurately transferring a desirable pattern. CONSTITUTION: A plurality of test patterns with different sizes are formed(S101). The plurality of test patterns with different sizes are measured(S103). A previously defined modeling method is applied to the measurement result(S105). A line end is corrected to be suitable for the line pattern of the nano imprint mask extracted from the test pattern through a modeling process(S107).</p> |
