发明名称 POSITION ADJUSTMENT DEVICE, POSITION ADJUSTING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a position adjustment device that can easily adjust relative positions of a target material supplying portion and a laser beam of light. <P>SOLUTION: The position adjustment device adjusts relative positions of the supplying portion 14 for supplying a target material and a laser beam of light L for exciting the supplied target material. To accomplish this, the position adjustment device includes to-be-irradiated members WX, WY disposed in a predetermined positional relationship with the supplying portion and transfer devices 71, 72 that move the members WX, WY relative to the laser beam of light while holding the predetermined positional relationship between the supplying portion and the members WX, WY. Based on a consequence of casting the laser light on the members WX, WY, the position adjustment device adjusts the relative positions of the supplying portion and the laser light. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011134887(A) 申请公布日期 2011.07.07
申请号 JP20090292855 申请日期 2009.12.24
申请人 NIKON CORP 发明人 SHIBATA AKIRA
分类号 H01L21/027 主分类号 H01L21/027
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