METHOD FOR DESIGNING MASK, APPARATUS FOR DESIGNING MASK, PROGRAM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for designing a mask, capable of reducing a process time of an OPC process.

SOLUTION: The method for designing a mask includes steps of: acquiring a layout data showing a layout; reading out a first post-OPC process data corresponding to the layout data from a table that correlates a basic layout data representing a basic layout and a first post-OPC process data after a first OPC process with respect to the basic layout data; creating a first initially corrected data of the layout data by adding the read first post-OPC process data to the layout data; and creating a second post-OPC process data by carrying out at least once a second OPC process on the first initially corrected data so as to obtain a desired feature of the layout data.

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