| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve positioning accuracy of an exposure pattern by controlling an exposure position in an analog manner. <P>SOLUTION: An exposure apparatus includes a beam spot generator 9 that receives light source light L<SB>1</SB>, and generates a plurality of beam spots staggered at least in two rows at prescribed intervals, a light scanner 10 of performing reciprocating scanning of the plurality of beam spots in their arrangement directions within their prescribed ranges, a pattern generator 11 that matches the center of axis to the center of reciprocating scanning of the plurality of beam spots for arrangement, and turns on and off a plurality of switching elements each comprising a corner tubular electrooptical crystal material including a pair of electrodes on an opposing surface in parallel with the center axis, thus generating a prescribed bright or dark pattern by optically modulating the light source light L<SB>1</SB>; and a projection lens 12 for projecting the dark or bright pattern onto a color filter substrate 5. Width in a scanning direction of the beam spot of the switching element is made larger than that in the same direction of the beam spot. <P>COPYRIGHT: (C)2011,JPO&INPIT |
