| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress the occurrence of vibrations or other disturbances which may act on a projection system of a lithographic apparatus (also referred to as a projection lens) by movements of a substrate stage, a patterning device stage (for example, a mask stage), a cooling device etc. <P>SOLUTION: A projection system is mounted on a reference structure of a lithographic apparatus by an active lens mount. The active lens mount has a top part with a top surface 27 and a bottom part with a bottom surface 28. The top and bottom parts are interconnected by elastic structures 50 at both sides. Furthermore, the top and bottom parts are interconnected by a piezoelectric actuator-sensor combined body shown as 30, 40. By using a suitable electric signal, a required force acting between the top and bottom parts via the piezoelectric elements 30, 40 can be extracted. <P>COPYRIGHT: (C)2011,JPO&INPIT |
