| 摘要 |
<p>PURPOSE: A photomask developing device and a developing method thereof are provided to suppress a bomb type defect in a developing process by removing particles using a cleaning bath. CONSTITUTION: An outer wall(210) isolates the inner space for developing a photomask(100) from the outside. A loading/unloading unit(220) loads and unloads the photomask exposed with an electronic beam. A cleaning bath(250) cleans the photomask loaded by the loading/unloading unit. A developing chamber(260) develops the phtomask by spraying the developer. A stage(268) is arranged to rotate the photomask in a developing chamber.</p> |
